PRODUCT
Cathodoluminescence Imaging System
The strength of the Cathodoluminescence (CL) system lies in its ability to combine functional optical information with the excellent spatial resolution of electron microscopy. This enables the exploration of various fundamental properties of materials at the microscopic scale. It is widely used in fields such as semiconductors, materials science, geology, physics, chemistry, and microelectronics.
Electron Beam Lithography Series
Electron beam lithography refers to the process of creating patterns on photoresist using a focused electron beam, an extension of the photolithography process. The electron beam lithography system is the hardware platform that enables this technology, with system performance determining key parameters such as critical dimensions, stitching, and overlay accuracy in the exposure process.
Cryogenic Cooling Stage Series
Cryogenic Cooling Stage is a functional accessory for scanning electron microscopes, allowing samples to be maintained in an extremely low-temperature environment. It is suitable for in-situ microscopic studies at ultra-low temperatures in fields such as physics, chemistry, materials science, and other scientific disciplines.
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