1、 The pain of "neck blockage" caused by nanoscale manufacturing

As the core equipment for achieving nanoscale precision, the high-end electron beam lithography machine market has long been monopolized by overseas giants. Domestic research institutions and enterprises not only face high procurement costs, but also face constraints in technology upgrades and after-sales support.

The Pharos 310 electron beam exposure system independently developed by Jinjing Technology has achieved a breakthrough in domestic high-end equipment with multiple international first-class technical indicators, providing researchers with a high-performance and cost-effective domestic alternative solution.

2、 Core advantage: The technological highlights of Pharos 310

3、 Application scenario: The scientific research value of Pharos 310

With the increasing emphasis on the localization of high-end scientific instruments by the country, the localization of electron beam exposure equipment is of great significance. The Pharos 310 independently developed by Jinjing Technology not only fills the gap of high-end equipment in China, but also provides reliable tools for scientific researchers, making domestic high-precision and cutting-edge equipment a "breakthrough tool" in the field of science and technology.